PATTERNING OF TWO-DIMENSIONAL PHOTONIC CRYSTAL STRUCTURES BY NANOIMPRINT LITHOGRAPHY
| Autor: | O. Wilhelmi, Shahrain bin Mahmood, Soo Jin Chua, B. Z. Wang, Herbert O. Moser, A. Chen, B T Saw, J R Kong |
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| Rok vydání: | 2006 |
| Předmět: |
Fabrication
Materials science Silicon chemistry.chemical_element Bioengineering Nanotechnology Substrate (electronics) Condensed Matter Physics Computer Science Applications Nanoimprint lithography law.invention chemistry law Multiple patterning General Materials Science Electrical and Electronic Engineering Lithography Next-generation lithography Biotechnology Photonic crystal |
| Zdroj: | Scopus-Elsevier |
| ISSN: | 1793-5350 0219-581X |
| DOI: | 10.1142/s0219581x06004796 |
| Popis: | We report on the process parameters of nanoimprint lithography for the fabrication of two-dimensional (2D) photonic crystals. The nickel mold with 2D photonic crystal patterns covering an area up to 20 mm2 is produced by electron-beam lithography and electroplating. Periodic pillars as high as 200 nm to 250 nm are produced on the mold with the diameters ranging from 180 nm to 500 nm. Optimization of process parameters is essential to generate high-quality nanoscale patterns and control the residual stress in the mold. The mold is employed for nanoimprinting on the poly-methyl-methacrylate (PMMA) layer spin-coated on the silicon substrate. Periodic air holes are formed in PMMA above its glass-transition temperature and the patterns on the mold are well transferred. This process can be utilized for commercial applications of photonic crystal devices. |
| Databáze: | OpenAIRE |
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