Functional nano-structuring of thin silicon nitride membranes
| Autor: | Milan Matějka, Stanislav Krátký, Tomáš Řiháček, Alexandr Knápek, Vladimír Kolařík |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2020 |
| Předmět: |
Materials science
Nano structuring Nanotechnology 02 engineering and technology silicon etching 01 natural sciences electron optics chemistry.chemical_compound electron beam lithography 0103 physical sciences nano optical device Reactive-ion etching membrane microfabrication 010302 applied physics 021001 nanoscience & nanotechnology reactive ion etching Membrane silicon nitride Silicon nitride chemistry Electron optics 0210 nano-technology Silicon etching Electron-beam lithography Microfabrication |
| Zdroj: | Journal of Electrical Engineering . 2020, vol. 71, issue 2, p. 127-130. |
| Popis: | The paper describes the development and production of a nano-optical device consisting of a nano-perforated layer of silicon nitride stretched in a single-crystal silicon frame using electron beam lithography (EBL) and reactive ion etching (RIE) techniques. Procedures for transferring nanostructures to the nitride layer are described, starting with the preparation of a metallic mask layer by physical vapor deposition (PVD), high-resolution pattern recording technique using EBL and the transfer of the motif into the functional layer using the RIE technique. Theoretical aspects are summarized including technological issues, achieved results and application potential of patterned silicon nitride membranes. |
| Databáze: | OpenAIRE |
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