Inhibition of interlayer diffusion and reduction of impurities in thin metal films by ion irradiation

Autor:	I. O. Kruhlov, A. K. Orlov, O. Dubikovskyi, Y. Iguchi, Zoltán Erdélyi, S. I. Sidorenko, T. Ishikawa, S. V. Prikhodko, S. M. Voloshko
Rok vydání:	2023
Předmět:	History Polymers and Plastics Mechanics of Materials Materials Chemistry General Materials Science Business and International Management Industrial and Manufacturing Engineering
Zdroj:	Materials Today Communications. 34:104977
ISSN:	2352-4928
DOI:	10.1016/j.mtcomm.2022.104977
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9763fbf035e061bcbbb1a29321e1a332 https://doi.org/10.1016/j.mtcomm.2022.104977 Zobrazit plný text záznamu Full Text from ScienceDirect