Shaping X-rays by diffractive coded nano-optics
| Autor: | Burkhard Kaulich, Filippo Romanato, Dan Cojoc, E. Vitale, Giuseppe Gigli, Thomas Wilhein, Luca Businaro, J. Susini, R. Cingolani, M. Altissimo, M. De Vittorio, Stefano Cabrini, E. Di Fabrizio |
|---|---|
| Přispěvatelé: | E., Di Fabrizio, S., Cabrini, D., Cojoc, F., Romanato, L., Businaro, M., Altissimo, B., Kaulich, T., Wilhein, J., Susini, DE VITTORIO, Massimo, E., Vitale, G., Gigli, Cingolani, Roberto |
| Rok vydání: | 2003 |
| Předmět: |
Diffraction
Physics Fabrication business.industry Nanophotonics Physics::Optics Radiation Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials X-ray optical elements Optics Cardinal point Extreme ultraviolet Optoelectronics Electrical and Electronic Engineering business Lithography Maskless lithography |
| Zdroj: | Microelectronic Engineering. :87-95 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/s0167-9317(03)00063-7 |
| Popis: | In this paper we report results obtained in the fabrication and use of novel coded diffractive nano-optics that, beyond focusing, can perform new optical functions. In particular, the intensity of light in the space beyond the optical elements can be redistributed with almost complete freedom. These novel X-ray optical elements have been tested and found to perform multi-focusing in single or multiple focal planes and beam shaping of a generic monochromatic beam into a desired continuous geometrical pattern. Already available extreme ultraviolet and X-ray sources are suitable as ideal sources for such diffractive optical elements. Their new optical functions have been tested in differential interference contrast microscopy and we suggest their use also in maskless lithography and chemical vapour deposition induced by extreme ultraviolet and X-ray radiation. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect