Reactive Pulsed Laser Deposition of titanium nitride thin film: Optimization of process parameters using Secondary Ion Mass Spectrometry
| Autor: | A.K. Balamurugan, R. Krishnan, Tom Mathews, A.K. Tyagi, Baldev Raj, Vikram Jayaram, Sitaram Dash |
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| Rok vydání: | 2010 |
| Předmět: |
Materials science
Analytical chemistry Materials Engineering (formerly Metallurgy) General Physics and Astronomy chemistry.chemical_element Single step Surfaces and Interfaces General Chemistry Condensed Matter Physics Titanium nitride Surfaces Coatings and Films Pulsed laser deposition Metal Secondary ion mass spectrometry chemistry.chemical_compound chemistry Scientific method visual_art visual_art.visual_art_medium Thin film Tin |
| Zdroj: | Applied Surface Science. 256:3077-3080 |
| ISSN: | 0169-4332 |
| DOI: | 10.1016/j.apsusc.2009.11.076 |
| Popis: | Reactive Pulsed Laser Deposition is a single step process wherein the ablated elemental metal reacts with a low pressure ambient gas to form a compound. We report here a Secondary Ion Mass Spectrometry based analytical methodology to conduct minimum number of experiments to arrive at optimal process parameters to obtain high quality TiN thin film. Quality of these films was confirmed by electron microscopic analysis. This methodology can be extended for optimization of other process parameters and materials. (C) 2009 Elsevier B.V. All rights reserved. |
| Databáze: | OpenAIRE |
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