High-resolution x-ray spectroscopy with superconducting tunnel junctions

Autor:	Franz von Feilitzsch, J. Höhne, J. Jochum, P. Hettl, G. Angloher, H. Kraus, R. L. Mössbauer
Rok vydání:	1999
Předmět:	Superconductivity X-ray spectroscopy business.industry Resolution (electron density) chemistry.chemical_element Substrate (electronics) Full width at half maximum Optics chemistry Aluminium Tunnel junction business Spectroscopy Residual-resistance ratio
Zdroj:	X-Ray Spectrometry. 28:309-311
ISSN:	1097-4539 0049-8246
DOI:	10.1002/(sici)1097-4539(199909/10)28:5<309::aid-xrs341>3.0.co;2-1
Popis:	An energy resolution of Delta E = 12 eV (FWHM) was measured for the Mn-55 K alpha(1) line (E = 5.90 keV) using a single superconducting Al/AlxOy/Al tunnel junction. The total detector area of 100 x 100 mu m was illuminated, while a slit mask of about 150 mu m width was used to shadow the detector leads and substrate area from the impinging x-rays. The total electronic noise contribution to the energy resolution was measured as Delta E-elec = 7 eV (FWHM). The process of tunnel junction fabrication was optimized towards a reproducible and high-quality growth of the tunnel barrier. High-quality aluminium films promote long quasi-particle lifetimes and ensure reproducible tunnel barrier growth. The residual resistance ratio of a 1 mu m thick aluminium test film was about 100, Copyright (C) 1999 John Wiley and Sons, Ltd.
Databáze:	OpenAIRE
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