Direct Writing on Copper Ion Doped Silica Films by Electrogeneration of Metallic Microstructures

Autor: Lucien Saviot, Jackie Vigneron, Arnaud Etcheberry, Hélène Cattey, Guillaume Herlem, Tijani Gharbi, Mathieu Frégnaux, Ahmed Kandory
Přispěvatelé: Nanomédecine, imagerie, thérapeutique - UFC (EA 4662) (NIT / NANOMEDECINE), Université de Franche-Comté (UFC), Université Bourgogne Franche-Comté [COMUE] (UBFC)-Université Bourgogne Franche-Comté [COMUE] (UBFC), Institut de Chimie Moléculaire de l'Université de Bourgogne [Dijon] (ICMUB), Université de Bourgogne (UB)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Laboratoire Interdisciplinaire Carnot de Bourgogne (LICB), Université de Bourgogne (UB)-Centre National de la Recherche Scientifique (CNRS), Institut Lavoisier de Versailles (ILV), Université de Versailles Saint-Quentin-en-Yvelines (UVSQ)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Scientific Research and Cultural Bureau/Embassy of the Republic of Iraq in Paris, France Campus France French RENATECH network Iraqi Ministry of Higher Education, Nanomédecine, imagerie, thérapeutique - UFC ( NIT / NANOMEDECINE ), Université Bourgogne Franche-Comté ( UBFC ) -Université de Franche-Comté ( UFC ), Institut de Chimie Moléculaire de l'Université de Bourgogne [Dijon] ( ICMUB ), Université de Bourgogne ( UB ) -Centre National de la Recherche Scientifique ( CNRS ), Laboratoire Interdisciplinaire Carnot de Bourgogne ( LICB ), Institut Lavoisier de Versailles ( ILV ), Université de Versailles Saint-Quentin-en-Yvelines ( UVSQ ) -Centre National de la Recherche Scientifique ( CNRS )
Jazyk: angličtina
Rok vydání: 2017
Předmět:
Zdroj: Journal of Physical Chemistry C
Journal of Physical Chemistry C, American Chemical Society, 2017, 121 (2), pp.1129-1139. ⟨10.1021/acs.jpcc.6b09913⟩
Journal of Physical Chemistry C, American Chemical Society, 2017, 121 (2), pp.1129-1139. 〈http://pubs.acs.org/doi/abs/10.1021/acs.jpcc.6b09913〉. 〈10.1021/acs.jpcc.6b09913〉
ISSN: 1932-7447
1932-7455
DOI: 10.1021/acs.jpcc.6b09913⟩
Popis: International audience; A facile and rapid localized electrochemical reduction of colloid copper particles is proposed using the scanning electrochemical,microscope (SECM), technique. In this purpose, thin films of composite silica :glass containing copper salts were prepared by the sol-gel method via the dip coating technique. Acid-catalyzed tetraethylorthosilane (TEOS) solutions charged with copper nitrate were used as precursors. This one-pot experiment can be performed in mild conditions. The localized generation of copper metallic nanostructures on silica film has been performed by electroreduction of methyl viologen on an ultramicroelectrode (UME). The UME generates reducing species, which in turn diffuse:toward the silica matrix and reduce the metal ions. The diameter of the working electrode and the electrolysis period Were taken into account to study the size of the generated dotted micropatterns. The compositions of the modified silica films were characterized by X-ray diffraction (XRD), scanning,electronic microscopy (SEM), optical microscopy,, and vibrational (IR-ATR and Raman) and X-ray photoelectron spectroscopies (XPS).
Databáze: OpenAIRE