Roughness and Light Scattering of Ion-Beam-Sputtered Fluoride Coatings for 193 nm
| Autor: | Josep Ferré-Borrull, Etienne Quesnel, Angela Duparré |
|---|---|
| Přispěvatelé: | Publica, Universitat de Barcelona |
| Rok vydání: | 2008 |
| Předmět: |
optical properties
Dispersió de la llum Materials science Ion beam thin film Materials Science (miscellaneous) Surface finish engineering.material Inelastic scattering Industrial and Manufacturing Engineering Light scattering chemistry.chemical_compound Optics scanning microscopy Coating Òptica electrònica Business and International Management scattering measurement Elastic scattering business.industry Scattering Electron optics UV chemistry engineering x-ray laser business Fluoride |
| Zdroj: | Dipòsit Digital de la UB Universidad de Barcelona Scopus-Elsevier Recercat. Dipósit de la Recerca de Catalunya instname |
| ISSN: | 1559-128X |
| Popis: | Scattering characteristics of multilayer fluoride coatings for 193 nm deposited by ion beam sputtering and the related interfacial roughnesses are investigated. Quarter- and half-wave stacks of MgF(2) and LaF(3) with increasing thickness are deposited onto CaF(2) and fused silica and are systematically characterized. Roughness measurements carried out by atomic force microscopy reveal the evolution of the power spectral densities of the interfaces with coating thickness. Backward-scattering measurements are presented, and the results are compared with theoretical predictions that use different models for the statistical correlation of interfacial roughnesses. |
| Databáze: | OpenAIRE |
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