Pulsed DC magnetron sputtering of transparent conductive oxide layers
| Autor: | Kevin Füchsel, Norbert Kaiser, Astrid Bingel, Andreas Tünnermann |
|---|---|
| Přispěvatelé: | Publica |
| Jazyk: | angličtina |
| Rok vydání: | 2013 |
| Předmět: |
Materials science
business.industry Band gap Pulsed DC zinc oxide Sputter deposition Atomic and Molecular Physics and Optics indium tin oxide Electronic Optical and Magnetic Materials Indium tin oxide Moss-Burstein shift Optics transparent conductive oxide Electrical resistivity and conductivity Sputtering Optoelectronics Electrical and Electronic Engineering Thin film business DC magnetron sputtering Transparent conducting film |
| Popis: | A comprehensive material study of different transparent conductive oxides (TCOs) is presented. The layers are deposited by pulsed direct current (DC) magnetron sputtering in an inline sputtering system. Indium tin oxide (ITO) films are studied in detail. The optimum pressure of 0.33 Pa (15Ar:2O2) produces a 300-nm thin film with a specific resistivity \rho of 2.2 \times 10-6 m and a visual transmittance of 81%. Alternatively, ZnO:Al and ZnO:Ga layers with thicknesses of 200 and 250 nm are deposited with a minimum resistivity of 5.5 \times 10-6 and 6.8 \times 10-6 m, respectively. To compare the optical properties in the ultraviolet (UV) range, the optical spectra are modeled and the band gap is determined. |
| Databáze: | OpenAIRE |
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