Harnessing charge injection in Kelvin probe force microscopy for the evaluation of oxides
| Autor: | Soon-oh Park, C. Smith, K. Ryu, Umberto Celano, Y. Lee, P. van der Heide, J. Serron, Jo-Won Lee, Jacopo Franco, Jong M Kim, Moon-Deock Kim |
|---|---|
| Přispěvatelé: | Interfaces and Correlated Electron Systems, MESA+ Institute |
| Jazyk: | angličtina |
| Rok vydání: | 2021 |
| Předmět: |
Characterization techniques for dielectrics and interfaces
KPFM Charge injection Materials science Oxide 02 engineering and technology Dielectric 01 natural sciences chemistry.chemical_compound Condensed Matter::Materials Science 0103 physical sciences Microscopy Materials Chemistry Physics::Atomic and Molecular Clusters Electrical and Electronic Engineering 010302 applied physics Kelvin probe force microscope business.industry C-AFM Charge density Charge (physics) 021001 nanoscience & nanotechnology Condensed Matter Physics Electronic Optical and Magnetic Materials chemistry Dielectrics characterization Optoelectronics 0210 nano-technology business Volta potential |
| Zdroj: | Solid-state electronics, 185:108136. Elsevier |
| ISSN: | 0038-1101 |
| DOI: | 10.1016/j.sse.2021.108136 |
| Popis: | We report on a quantitative use of Kelvin probe force microscopy (KPFM) for the analysis of charge injection in thin oxides. Here, thin dielectrics are investigated through an atomic force microscopy tip that is used as a movable (virtual) top-electrode. The charge is injected and read-out respectively by alternating the direct contact of the probe with the oxide, and with non-contact surface potential imaging. The contact potential difference (CPD) between the atomic force microscope tip and the oxide surface is used to measure the charge distribution under multiple electrical stress conditions, thus correlating locally trapped charge with dielectric properties. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect