Effective Third-Order Nonlinearities in Metallic Refractory Titanium Nitride Thin Films
| Autor: | Nathaniel Kinsey, Akbar Ali Syed, Carl E. Bonner, Alexandra Boltasseva, Clayton DeVault, V. I. Gavrilenko, Devon Courtwright, Eric W. Van Stryland, Vladimir M. Shalaev, David J. Hagan |
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| Rok vydání: | 2015 |
| Předmět: |
Materials science
business.industry Nanophotonics chemistry.chemical_element Nonlinear optics FOS: Physical sciences Titanium nitride Electronic Optical and Magnetic Materials Nonlinear system chemistry.chemical_compound chemistry Optoelectronics Thin film Tin business Order of magnitude Plasmon Physics - Optics Optics (physics.optics) |
| DOI: | 10.48550/arxiv.1507.06674 |
| Popis: | Nanophotonic devices offer an unprecedented ability to concentrate light into small volumes which can greatly increase nonlinear effects. However, traditional plasmonic materials suffer from low damage thresholds and are not compatible with standard semiconductor technology. Here we study the nonlinear optical properties in the novel refractory plasmonic material titanium nitride using the Z-scan method at 1550 nm and 780 nm. We compare the extracted nonlinear parameters for TiN with previous works on noble metals and note a similarly large nonlinear optical response. However, TiN films have been shown to exhibit a damage threshold up to an order of magnitude higher than gold films of a similar thickness, while also being robust, cost-efficient, bio- and CMOS-compatible. Together, these properties make TiN a promising material for metal-based nonlinear optics. |
| Databáze: | OpenAIRE |
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