Front-end design issues in soft-x-ray projection lithography
| Autor: | Andrew M. Hawryluk, Natale M. Ceglio, Gary E. Sommargren |
|---|---|
| Rok vydání: | 2010 |
| Předmět: |
Physics
business.industry Stray light Astrophysics::High Energy Astrophysical Phenomena Materials Science (miscellaneous) X-ray optics Synchrotron radiation Undulator Industrial and Manufacturing Engineering law.invention Front and back ends Optics law Optoelectronics Business and International Management Photolithography business Projection (set theory) Lithography |
| Zdroj: | Applied optics. 32(34) |
| ISSN: | 1559-128X |
| Popis: | We present a protocol for the design of an illumination system (front end) for a soft-x-ray projection lithography tool. The protocol is illustrated by specific front-end designs. The most complete design analysis is for a laser-driven system. Other drivers; undulator, synchrotron orbital radiation, and plasma discharge, are also discussed. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|