Control of Size Uniformity of Cu Nanoparticle Array Produced by Plasma-Induced Dewetting
| Autor: | Jung-Joong Lee, Han Joo Choe, Soon-Ho Kwon, Chin-Wook Chung, Hyo-Chang Lee |
|---|---|
| Rok vydání: | 2015 |
| Předmět: |
Materials science
business.industry Plasma parameters Biomedical Engineering Flux Energy flux Nanoparticle Bioengineering Nanotechnology General Chemistry Plasma Condensed Matter Physics Physics::Plasma Physics Optoelectronics Electron temperature General Materials Science Dewetting business Voltage |
| Zdroj: | Journal of Nanoscience and Nanotechnology. 15:2542-2546 |
| ISSN: | 1533-4899 1533-4880 |
| DOI: | 10.1166/jnn.2015.10237 |
| Popis: | The effects of plasma parameters such as plasma density, electron temperature, and sheath voltage on the uniformity of Cu nanoparticle arrays were investigated. These parameters were controlled by varying the pressure, RF power, and substrate bias voltage. A floating harmonic method was used to monitor the plasma parameters. Uniform nanoparticle arrays were produced when hole generation was increased by using a high ion.bombardment energy. As oppose to a low energy flux condition, where small and large nanoparticles coexisted due to a small number of holes, a larger number of holes was generated and distributed more uniformly during a high energy flux condition. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|