Passive and Active Plasma Emission Sources for High-current Electron Beam Generation

Autor:	I. Schnitzer, Vladislav Vekselman, A. Krokhmal, J. Z. Gleizer, Y. Hadas, K. Chirko, D. Yarmolich, Or Peleg, Joshua Felsteiner, Yakov E. Krasik
Rok vydání:	2007
Předmět:	Dense plasma focus Materials science business.industry Plasma parameters Electron Plasma Pulsed power Cathode law.invention Anode Optics law Capacitively coupled plasma Electrical and Electronic Engineering business
Zdroj:	Scopus-Elsevier
ISSN:	1347-5533 0385-4205
Popis:	In this review we present main results of experimental research of passive and active plasma sources for high-current electron beam generation obtained during the last few years in our Plasma & Pulsed Power Laboratory. We will describe passive plasma sources (ceramic-metal, velvet and carbon fiber cathodes) based on flashover plasma and active plasma sources based on a ferroelectric plasma source (FPS) as well as on an FPS-assisted hollow anode (HA) plasma source. The main data concerning the plasma parameters (plasma density and temperature, plasma uniformity and plasma potential) and the main features of these plasma sources (plasma formation, life time, vacuum compatibility) will be discussed. Also, data concerning electron diode operation and parameters of the generated electron beam while using these plasma sources will be presented.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8f6f5b1e16c8754840cb8db4c8215805 https://doi.org/10.1541/ieejfms.127.697 Zobrazit plný text záznamu