Influence of solvents and composition of etch-and-rinse and self-etch adhesive systems on the nanoleakage within the hybrid layer
| Autor: | Sofia S.A. Oliveira, João Cardoso Ferreira, Patrícia T. Pires, Paulo Melo, Álvaro Azevedo, Mário Jorge Silva |
|---|---|
| Rok vydání: | 2013 |
| Předmět: |
Silver Staining
Materials science tert-Butyl Alcohol Scanning electron microscope Surface Properties Smear layer Acrylic Resins Dental Cements Dental bonding Materials Testing Dentin medicine Humans General Dentistry Light-Curing of Dental Adhesives Dental Leakage Ethanol Dental Bonding Water Self etch adhesive Resin Cements medicine.anatomical_structure Dentin-Bonding Agents Smear Layer Microscopy Electron Scanning Solvents Methacrylates Adhesive Etch and rinse Layer (electronics) Nuclear chemistry |
| Zdroj: | The journal of contemporary dental practice. 14(4) |
| ISSN: | 1526-3711 |
| Popis: | Aim The goal of this study was to evaluate nanoleakage within the hybrid layer yielded by etch-and-rinse and self-etch adhesive systems, with different solvents and compositions. Materials and methods Four adhesives were applied onto 20 human dentin disks: group A: Adper Scotchbond 1XT™ (3M ESPE), group B: One Coat Bond® (Coltène Whaledent), group C: AdheSE® (Ivoclar Vivadent) and group D: Xeno-V® (Dentsply). The samples were immersed in aqueous ammoniacal silver nitrate for 24 hour, prepared and observed under field-emission scanning electron microscopy with backscattered electrons. Microphotographs were scanned and data were processed. The mean value and standard deviation were calculated. KruskalWallis and Mann-Whitney tests were used (p < 0.05). Results All the adhesives showed nanoleakage within the hybrid layer: Adper Scotchbond 1XT™ (218.5 μm ± 52.6 μm), One Coat Bond® (139.6 μm ± 79.0 μm), AdheSE® (92.7 μm ± 64.8 μm) and Xeno-V® (251.0 μm ± 85.2 μm). AdheSE® yielded less nanoleakage than Adper Scotchbond-1XT™ (p = 0.003) and than Xeno-V® (p = 0.007). No other statistically significant differences were detected. Conclusion Two-step self-etch adhesive system (AdheSE®) might contribute for lower nanoleakage deposition and thus better performance in dentin adhesion. Clinical significance The two-step self-etch adhesive system showed the lowest nanoleakage deposition compared with the other adhesive systems evaluated, which seems to indicate a better behavior when a restoration is performed in dentin and possibly can lead to a durable adhesion along time. How to cite this article Ferreira JC, Pires PT, Azevedo AF, Oliveira SA, Melo PR, Silva MJ. Influence of Solvents and Composition of Etch-and-Rinse and Self-Etch Adhesive Systems on the Nanoleakage within the Hybrid Layer. J Contemp Dent Pract 2013;14(4):691-699. |
| Databáze: | OpenAIRE |
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