NO Removal by Plasma-Enhanced NH3-SCR Using Methane as an Assistant Reduction Agent at Low Temperature

Autor: Gang Luo, Yanghaichao Liu, Heng Wei, Ruina Zhang, Renxi Zhang, Shanping Chen, Huiqi Hou, Weixuan Zhao
Jazyk: angličtina
Rok vydání: 2019
Předmět:
inorganic chemicals
Reducing agent
dielectric barrier discharge (DBD)
02 engineering and technology
010402 general chemistry
01 natural sciences
lcsh:Technology
Methane
lcsh:Chemistry
chemistry.chemical_compound
DBD–SCR assisted by CH4
parasitic diseases
No removal
General Materials Science
Fourier transform infrared spectroscopy
Instrumentation
lcsh:QH301-705.5
NOx
assistant reduction agent
NO abatement
Fluid Flow and Transfer Processes
Chemistry
lcsh:T
Process Chemistry and Technology
Chemical process of decomposition
General Engineering
Plasma
021001 nanoscience & nanotechnology
lcsh:QC1-999
0104 chemical sciences
Computer Science Applications
lcsh:Biology (General)
lcsh:QD1-999
lcsh:TA1-2040
0210 nano-technology
Selectivity
lcsh:Engineering (General). Civil engineering (General)
lcsh:Physics
Nuclear chemistry
Zdroj: Applied Sciences, Vol 9, Iss 13, p 2751 (2019)
Applied Sciences
Volume 9
Issue 13
ISSN: 2076-3417
Popis: The effects of using CH4 as an assistant reduction agent in plasma-assisted NH3&ndash
SCR were investigated. The new hybrid reaction system performed better than DBD&ndash
NH3&ndash
SCR when the O2 concentration varied from 2% to 12%. Compared with DBD&ndash
SCR, DBD&ndash
CH4&ndash
SCR (NH3:CH4 = 1:1) showed a more significant promotion effect on the performance and N2 selectivity for NOX abatement. When the O2 concentration was 6% and the SIE was 512 J/L, the NO removal efficiency of the new hybrid system reached 84.5%. The outlet gas components were observed via FTIR to reveal the decomposition process and its mechanism. This work indicated that CH4, as an assistant agent, enhances DBD&ndash
SCR in excess oxygen to achieve a new process with significantly higher activity at a low temperature (&le
348 K) for NOX removal.
Databáze: OpenAIRE