Extreme ultraviolet interference lithography for generation of platinum nanoparticles on glassy carbon

Autor: Guenther G. Scherer, Celestino Padeste, A. Foelske-Schmitz, Alexander Wokaun, Harun H. Solak, J. Ziegler, Vaida Auzelyte, A. Savouchkina, Rüdiger Kötz
Rok vydání: 2010
Předmět:
Zdroj: ECS Transactions
DOI: 10.1149/1.3316124
Popis: In order to investigate corrosion processes of a catalyst and/or its support in polymer electrolyte fuel cells (PEFC) model electrodes consisting of platinum nanodots upon glassy carbon (GC) substrate were produced via extreme ultraviolet interference lithography (EUV IL) and subsequent platinum deposition. The exposure experiments were performed at the X ray Interference Lithography (XIL) beamline of Swiss Light Source (SLS). The influence of exposure parameters (e.g. dose thickness of the photoresist amount of deposited platinum) and pre treatment of the GC substrate upon the size of produced nanostructures and their adhesion to the surface was closely monitored using scanning electron microscopy (SEM) and X ray photoelectron spectroscopy (XPS). The diameter of obtained Pt nanodots was in the range of 40 100 nm. It was found that the diameter of the obtained Pt nanodots was only dependent on the EUV dose. Thermal pretreatment of GC had no obvious influence on the process steps. ©The Electrochemical Society.
Databáze: OpenAIRE