Best test pattern failure analysis flow for functional logic failure localization by IR-OBIRCH technique
| Autor: | F. Essely, D. Lewis, V. Goubier, Philippe Perdu, Aziz Machouat, Vincent Pouget, Gérald Haller |
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| Přispěvatelé: | Darracq, Frédéric |
| Jazyk: | angličtina |
| Rok vydání: | 2009 |
| Předmět: |
[PHYS.PHYS.PHYS-OPTICS] Physics [physics]/Physics [physics]/Optics [physics.optics]
Engineering business.industry Pattern recognition Optical polarization Function (mathematics) Automatic test pattern generation [SPI.TRON] Engineering Sciences [physics]/Electronics Reliability engineering Test (assessment) Set (abstract data type) Logic state Flow (mathematics) Pattern matching Artificial intelligence business |
| Popis: | The optical IR-OBIRCh technique is a standard failure analysis tool used to localize defects that are located at interconnects layers levels. For a functional logic failure, a failing test pattern is used to condition the device into a particular logic state to generate the failure. Commonly, the defect is detected for a set of test patterns. All test patterns will not provide the same IR-OBIRCh response. A random selection of test patterns may not lead to localize the defect by IR-OBIRCh technique or give fake results. We have performed an extended study of IR-OBIRCh response of a functional logic failure in function of test patterns. Based on these results a best test pattern failure analysis flow has been developed and implemented in order to localize a functional logic failure with IR-OBIRCh technique. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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