Low-Temperature Electrical Performance of PureB Photodiodes Revealing Al-Metallization-Related Degradation of Dark Currents

Autor: Ivana Capan, Lis K. Nanver, Tomislav Suligoj, Tihomir Knezevic
Přispěvatelé: Integrated Devices and Systems
Rok vydání: 2021
Předmět:
Zdroj: IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices, 68(6), 2810-2817. IEEE
ISSN: 1557-9646
0018-9383
DOI: 10.1109/ted.2021.3074117
Popis: Pure boron (PureB) deposition as the anode region of Si photodiodes creates negative fixed charge at the boron/silicon interface, which is responsible for effective suppression of electron injection from the bulk, thus ensuring low saturation/dark current densities. This mechanism is shown here to remain effective when PureB diodes, fabricated at 700 °C, are operated at cryogenic temperatures down to 100 K. Although the PureB junctions were only a few nanometers deep, they displayed the same current–voltage ( ${I}$ – ${V}$ ) characteristics as conventional deep diffused p+-n junction diodes in the whole temperature range and also maintained ideality factors close to ${n} = 1$ . Al-contacting was found to reveal process-related defects in the form of anomalous high current regions giving kinks in the ${I}$ – ${V}$ characteristics, often only visible at low temperatures. They were identified as minute Al–Si Schottky junctions with an effective barrier height of ~0.65 ± 0.05 eV. In PureB single-photon avalanche diodes (SPADs), Al–Si perimeter defects appeared but did not affect the breakdown voltage characteristics set by implicit guard rings. Low series resistance required thin B-layers that promoted tunneling. In particular, for such thin layers, avoiding Al-related degradation puts stringent requirements on wafer cleaning and window etch procedures.
Databáze: OpenAIRE