Synthesis of nanopowders in a PECVD reactor from organosilicon precursor
Autor: | M. Kihel, Y. Fermi, Salah Sahli, Patrice Raynaud |
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Přispěvatelé: | Sciences et Ingénierie des Plasmas Réactifs et des Arcs (LAPLACE-ScIPRA), LAboratoire PLasma et Conversion d'Energie (LAPLACE), Université Toulouse III - Paul Sabatier (UT3), Université Fédérale Toulouse Midi-Pyrénées-Université Fédérale Toulouse Midi-Pyrénées-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université Fédérale Toulouse Midi-Pyrénées-Université Toulouse III - Paul Sabatier (UT3), Université Fédérale Toulouse Midi-Pyrénées |
Jazyk: | angličtina |
Rok vydání: | 2019 |
Předmět: |
Hexamethyldisiloxane
Thin layers 010405 organic chemistry Organic Chemistry [SPI.PLASMA]Engineering Sciences [physics]/Plasmas Nanoparticle Plasma 010402 general chemistry 01 natural sciences Biochemistry 0104 chemical sciences [SPI.MAT]Engineering Sciences [physics]/Materials Inorganic Chemistry chemistry.chemical_compound [SPI]Engineering Sciences [physics] chemistry Chemical engineering Plasma-enhanced chemical vapor deposition Deposition (phase transition) Thin film ComputingMilieux_MISCELLANEOUS Organosilicon |
Zdroj: | Phosphorus, Sulfur, and Silicon and the Related Elements Phosphorus, Sulfur, and Silicon and the Related Elements, Taylor & Francis, 2019, 194 (10), pp.978-982. ⟨10.1080/10426507.2019.1631311⟩ |
ISSN: | 1042-6507 1563-5325 |
DOI: | 10.1080/10426507.2019.1631311⟩ |
Popis: | In previous work, nanopowders have been obtained during the deposition of thin layers from Hexamethyldisiloxane (HMDSO) using low frequency plasma. The aim of this work is the study of the ... |
Databáze: | OpenAIRE |
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