Float-polishing process and analysis of float-polished quartz
Autor: | J. P. Black, K. C. Jungling, W. K. Stowell, David R. Baselt, S. F. Soares |
---|---|
Jazyk: | angličtina |
Rok vydání: | 1994 |
Předmět: |
Materials science
Float (project management) business.industry Materials Science (miscellaneous) Polishing Laminar flow Industrial and Manufacturing Engineering Light intensity Optics Surface roughness Business and International Management business Quartz Photoacoustic spectroscopy Pressure gradient |
Popis: | A fluid-mechanical model is developed for the float-polishing process. In this model laminar flow between the sample and the lap results in pressure gradients at the grooves that support the sample on a fluid layer. The laminar fluid motion also produces supersmooth, damage-free surfaces. Quartz substrates for applications in high-stress environments were float polished, and their surfaces were analyzed by optical scatterometry, photoacoustic spectroscopy, and atomic force microscopy. The removal of 100 µm of material by a lapping-polishing process, with final float polishing, left low levels of subsurface damage, with a surface roughness of approximately 0.2-nm rms. |
Databáze: | OpenAIRE |
Externí odkaz: |