Theoretical Analysis for Thermal Chemical Vapor Deposition from Tetraethoxysilane Using a Semi-Empirical Molecular Orbital Method

Autor:	Akio Fuwa, Mitsuhito Hirota, Takahiro Ishizaki, Nagahiro Saito
Rok vydání:	1999
Předmět:	Materials science Thermal chemical vapor deposition Chemical engineering Mechanics of Materials Materials Chemistry Metals and Alloys Organic chemistry Molecular orbital Condensed Matter Physics
Zdroj:	Scopus-Elsevier
ISSN:	1880-6880 0021-4876
DOI:	10.2320/jinstmet1952.63.7_931
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8c897b81433431616fe2d67d976bba60 https://doi.org/10.2320/jinstmet1952.63.7_931 Zobrazit plný text záznamu