Optical Property of Random Inverted-Pyramid Textures on Si Surface by Etching with N-Fluoropyridinium Salts
| Autor: | Toshinori Hirano, Junichi Uchikoshi, Masaki Otani, Kentaro Tsukamoto, Kenji Adachi, Kenta Arima, Kentaro Kawai, Takabumi Nagai, Mizuho Morita |
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| Rok vydání: | 2013 |
| Předmět: |
Surface (mathematics)
Materials science business.industry fungi technology industry and agriculture Optical property Oxide macromolecular substances law.invention chemistry.chemical_compound Optics chemistry Resist law Etching (microfabrication) Optoelectronics Wafer Photolithography business Pyramid (geometry) |
| Zdroj: | ECS Transactions. 50:109-114 |
| ISSN: | 1938-6737 1938-5862 |
| DOI: | 10.1149/05051.0109ecst |
| Popis: | Lowering the surface reflectance of Si wafers by texturization is important for improving the efficiency of Si solar cells. For single crystalline Si solar cells, the anisotropic etching of an Si(100) plane with alkaline solutions is effective in formation of pyramid textures and has been widely applied in their production (1). Invertedpyramid textures with low reflectance have been formed by alkaline etching with an oxide mask (2). Photolithography is often used in the formation of etching masks. In photolithography and etching, a pattern is formed on an Si surface by the following processes: applying resist, exposure, developing and etching. A number of processes increases the cost of the production. It is necessary to reduce the number of processes in order to reduce the production cost. We have proposed a new photo-etching method (3) of an Si wafer involving fewer processes: applying N-fluoropyridinium salt (4) and light exposure. In this work, we have found that random inverted-pyramid textures are formed on an Si surface by this method of photo-etching. |
| Databáze: | OpenAIRE |
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