Filament Assisted Chemical Vapor Deposited organosilicate as chemical layer for nanometric hydrocarbon gas sensors

Autor: B. Altemus, Vincent Jousseaume, Carine Ladner, J. El Sabahy, E. Ollier, J. Faguet, C. Yeromonahos, K. Benedetto
Přispěvatelé: Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), US-Technology Development Center
Jazyk: angličtina
Rok vydání: 2018
Předmět:
Materials science
Silicon
[PHYS.PHYS.PHYS-BIO-PH]Physics [physics]/Physics [physics]/Biological Physics [physics.bio-ph]
chemistry.chemical_element
02 engineering and technology
Chemical vapor deposition
010402 general chemistry
01 natural sciences
Partition coefficient
Materials Chemistry
Deposition (phase transition)
Electrical and Electronic Engineering
Instrumentation
Nano electro mechanical system
Nanoelectromechanical systems
Metals and Alloys
MTES
Quartz crystal microbalance
[CHIM.MATE]Chemical Sciences/Material chemistry
021001 nanoscience & nanotechnology
Condensed Matter Physics
CVD
[INFO.INFO-MO]Computer Science [cs]/Modeling and Simulation
0104 chemical sciences
Surfaces
Coatings and Films
Electronic
Optical and Magnetic Materials
[CHIM.THEO]Chemical Sciences/Theoretical and/or physical chemistry
Chemical engineering
chemistry
QCM
Gravimetric analysis
Surface modification
[PHYS.PHYS.PHYS-CHEM-PH]Physics [physics]/Physics [physics]/Chemical Physics [physics.chem-ph]
0210 nano-technology
SiOCH thin films
Layer (electronics)
Zdroj: Sensors and Actuators B: Chemical
Sensors and Actuators B: Chemical, Elsevier, 2018, 271, pp.271-279. ⟨10.1016/j.snb.2018.05.042⟩
Sensors and Actuators B: Chemical, 2018, 271, pp.271-279. ⟨10.1016/j.snb.2018.05.042⟩
ISSN: 0925-4005
DOI: 10.1016/j.snb.2018.05.042⟩
Popis: International audience; The fabrication of gravimetric gas sensors based on Nano Electro Mechanical System (NEMS) requires the use ofa chemical sensitive layer that is uniformly deposited by a solvent-free deposition technique. In this work, weshow than an organosilicate layer deposited by Filament-Assisted Chemical Vapor Deposition using methyl-triethoxysilane presents very high affinity toward hydrocarbon gas. High partition coefficients toward tolueneand pentane were obtained on Quartz Crystal Microbalance sensors after being annealed at 400 °C. It is shownthat the hydrophobic nature of this material composed of a SieOeSi backbone with methyl groups bonded tosilicon, combined with the presence of isolated ethoxy groups and microporosity, allow a very high sensibility incomparison to others SiOCH. Furthermore, the functionalization of NEMS-based gas sensors was demonstrated.This material, deposited using a CMOS compatible technique, constitutes a promising solution for the devel-opment of a complete and portable multi-gas analysis system.
Databáze: OpenAIRE
Externí odkaz: