Deposition and patterning of magnetic atom trap lattices in FePt films with periods down to 200 nm
| Autor: | André Vantomme, Sebastien Couet, A. L. La Rooij, Robert J. C. Spreeuw, M. C. van der Krogt, Kristiaan Temst |
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| Přispěvatelé: | Quantum Gases & Quantum Information (WZI, IoP, FNWI), IoP (FNWI) |
| Jazyk: | angličtina |
| Rok vydání: | 2018 |
| Předmět: |
Materials science
Atomic Physics (physics.atom-ph) Scanning electron microscope FOS: Physical sciences General Physics and Astronomy Magnetic lattice 02 engineering and technology 01 natural sciences Focused ion beam Physics Applied Physics - Atomic Physics Condensed Matter::Materials Science THIN-FILMS Lattice constant 0103 physical sciences 010306 general physics Quantum Physics Science & Technology Condensed matter physics Physics Coercivity 021001 nanoscience & nanotechnology Physical Sciences Ion milling machine Quantum Physics (quant-ph) 0210 nano-technology Electron-beam lithography Molecular beam epitaxy |
| Zdroj: | Journal of Applied Physics, 124(4):044902. American Institute of Physics Journal of Applied Physics, 124(4) |
| ISSN: | 0021-8979 |
| Popis: | We report on the epitaxial growth and the characterization of thin FePt films and the subsequent patterning of magnetic lattice structures. These structures can be used to trap ultracold atoms for quantum simulation experiments. We use Molecular Beam Epitaxy (MBE) to deposit monocrystalline FePt films with a thickness of 50 nm. The films are characterized with X-ray scattering and Mossbauer spectroscopy to determine the long range order parameter and the hard magnetic axes. A high monocrystalline fraction was measured as well as a strong remanent magnetization of M = 900 kA/m and coercivity of 0.4 T. Using Electron Beam Lithography (EBL) and argon ion milling we create lattice patterns with a period down to 200 nm, and a resolution of 30 nm. The resulting lattices are imaged in a Scanning Electron Microscope in cross-section created by a Focused Ion Beam. A lattice with continuously varying lattice constant ranging from 5 micrometer down to 250nm has been created to show the wide range of length scales that can now be created with this technique. 8 pages, 10 figures |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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