Improved modeling of isolated EDMOS in advanced CMOS technologies

Autor: Helene Beckrich Ros, Dominique Golanski, Sorin Cristoloveanu, Antoine Litty, Sylvie Ortolland
Přispěvatelé: Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC), Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS)
Jazyk: angličtina
Rok vydání: 2013
Předmět:
Zdroj: ICICDT 2013 (International Conference on IC Design and Technology
ICICDT 2013 (International Conference on IC Design and Technology, May 2013, Pavia, Italy. pp.25-28, ⟨10.1109/ICICDT.2013.6563295⟩
ICICDT
Popis: Based on systematic measurements in CMOS 40 nm bulk technology, we propose a new model for isolated Extended-Drain MOS (EDMOS) transistor. Our custom Spice macro-model includes main specific effects in high-voltage devices. In particular, the model accounts for the various parasitic bipolar components (PBCs) that are fully characterized. This model can cover various architectures, from bulk-Si to FDSOI.
Databáze: OpenAIRE