Thin films of molecular materials grown on silicon substrates by chemical vapor deposition and electrodeposition
| Autor: | Lydie Valade, Christophe Faulmann, D. de Caro, Manuel Almeida, Isabelle Malfant, Jordi Fraxedas, James S. Brooks, Jean-Philippe Savy |
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| Rok vydání: | 2006 |
| Předmět: |
Working electrode
Materials science Extended X-ray absorption fine structure Silicon Analytical chemistry chemistry.chemical_element Chemical vapor deposition Combustion chemical vapor deposition Condensed Matter Physics XANES Atomic and Molecular Physics and Optics chemistry Molecule General Materials Science Thin film |
| Zdroj: | Journal of Low Temperature Physics. 142:393-396 |
| ISSN: | 1573-7357 0022-2291 |
| DOI: | 10.1007/bf02679528 |
| Popis: | Chemical vapor deposition (CVD) and electrodeposition (ED) were applied to grow thin films of molecule-based magnets and conductors. Chemical vapor deposited films are illustrated by the M(TCNE)x (M=V, Cr, Nb, Mo) magnet series. V(TCNE)x and Cr(TCNE)x are room-temperature magnets. XANES/EXAFS studies on the air-stable Cr(TCNE)x have been performed to determine the chemical environment of the chromium within the polymeric network. Electrodeposition on a silicon working electrode was applied to process thin films of numerous molecule-based conductors, namely, non-integral oxidation state compounds, charge transfer complexes, and singlecomponent molecular conductors. Among the series of conductive thin films, TTF[Ni(dmit)2]2 and Ni(tmdt)2 exhibit a metal-like behavior. |
| Databáze: | OpenAIRE |
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