Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering
| Autor: | M. Sillassen, Madanagurusamy Sridharan, Per Eklund, Jørgen Bøttiger, Kjeld Møller Pedersen |
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| Rok vydání: | 2010 |
| Předmět: |
Materials science
Alumina Metals and Alloys Analytical chemistry Recrystallization (metallurgy) TEKNIKVETENSKAP Preferred orientation Surfaces and Interfaces Sputter deposition Microstructure Chromia X-ray diffraction Surfaces Coatings and Films Electronic Optical and Magnetic Materials Coatings Physical vapor deposition Materials Chemistry TECHNOLOGY Thin film Inductively coupled plasma Solid solution |
| Zdroj: | Pedersen, K, Bøttiger, J, Sridharan, M G, Sillassen, M B & Eklund, P 2010, ' Texture and microstructure of Cr 2 O 3 and (Cr,Al) 2 O 3 thin films deposited by reactive inductively coupled plasma magnetron sputtering ', Thin Solid Films, vol. 518, no. 15, pp. 4294–4298 . https://doi.org/10.1016/j.tsf.2010.01.008 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2010.01.008 |
| Popis: | Cr2O3 and (Cr,Al)(2)O-3 films were grown using reactive dc and inductively coupled plasma magnetron sputtering at substrate temperatures of 300-450 degrees C. For pure chromia, alpha-Cr2O3 films with fiber texture were grown; the out-of-plane texture could be controlled from andlt; 0001 andgt; to andlt;10andlt;(1)over barandgt;4andgt;. The former texture was obtained as a consequence of competitive growth with no applied bias or inductively coupled plasma, while the latter was obtained at moderate bias ( - 50 V), probably due to recrystallization driven by ion-bombardment-induced strain. By reactive codeposition of Cr and Al, a corundum-structured metastable solid solution alpha-(Cr,Al)(2)O-3 with Cr/Al ratios of 2-10 was grown with a dense, fine-grained morphology. Hardness and reduced elastic modulus values were in the ranges 24-27 GPa and 190-230 GPa, respectively. Original Publication:K Pedersen, J Bottiger, M Sridharan, M Sillassen and Per Eklund, Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering, 2010, THIN SOLID FILMS, (518), 15, 4294-4298.http://dx.doi.org/10.1016/j.tsf.2010.01.008Copyright: Elsevier Science B.V., Amsterdam.http://www.elsevier.com/ |
| Databáze: | OpenAIRE |
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