| Autor: |
S. Singkarat, Nitipon Puttaraksa, Kanda Singkarat, Somrit Unai, Harry J. Whitlow, Michael W. Rhodes |
| Jazyk: |
angličtina |
| Rok vydání: |
2012 |
| Předmět: |
|
| Zdroj: |
Nuclear Instruments and Methods in Physics Research B. 272:149 |
| ISSN: |
0168-583X |
| Popis: |
In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1–1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chip fabricated by this technique was demonstrated to be a microfluidic device. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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