Rhombohedral photonic crystals by triple-exposure interference lithography: Complete photonic band gap
| Autor: | Yuri V. Miklyaev, Denis G. Pikhulya, N. D. Kundikova |
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| Rok vydání: | 2012 |
| Předmět: |
Optimization
Simple cubic Lithography Materials science Band gap Gap opening Refractive index Physics::Optics Cubic crystal system Crystals Photonic metamaterial Interference lithography Photonic crystals Optics Cubic symmetry Refractive index contrast Electrical and Electronic Engineering Physical and Theoretical Chemistry Electronic band structure Two-beam interference Photonic crystal business.industry Complete photonic band gap Crystal structure Band structure Photonic band gap Atomic and Molecular Physics and Optics Energy gap Electronic Optical and Magnetic Materials Band gaps Continuous transitions Face-centered cubic 3D photonic crystals Optimal conditions Optoelectronics Geometry optimization business |
| Zdroj: | Optics Communications. 285:1238-1241 |
| ISSN: | 0030-4018 |
| DOI: | 10.1016/j.optcom.2011.11.096 |
| Popis: | The band structure of 3D photonic crystal that could be synthesized by means of interference lithography with triple-exposure two-beam interference technique has been investigated. As a result of the geometry optimization the optimal conditions for maximal band gaps with different refractive index contrast have been obtained. The refractive index threshold for gap opening equaled to 2.14 has been predicted for this method of photonic crystals synthesis. This value is close to the refractive index thresholds of the best known structures. The continuous transition between simple cubic, face centered cubic and bulk centered cubic symmetries has been considered. © 2011 Elsevier B.V. All rights reserved. |
| Databáze: | OpenAIRE |
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