TOF MS Investigation of Nickel Oxide CVD
Autor: | Sergey E. Alexandrov, Maxim V. Mishin, Anastasia S. Kondrateva |
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Rok vydání: | 2017 |
Předmět: |
Ozone
Nickel oxide Inorganic chemistry Non-blocking I/O Analytical chemistry chemistry.chemical_element 02 engineering and technology Chemical vapor deposition Atmospheric temperature range 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Oxygen 0104 chemical sciences chemistry.chemical_compound Nickel chemistry Structural Biology Metalorganic vapour phase epitaxy 0210 nano-technology Spectroscopy |
Zdroj: | Journal of the American Society for Mass Spectrometry. 28:2352-2360 |
ISSN: | 1044-0305 |
DOI: | 10.1007/s13361-017-1765-1 |
Popis: | NiO layers were deposited by metal-organic chemical vapor deposition using bis-(ethylcyclopentadienyl) nickel (EtCp)2Ni and oxygen or ozone. As a continuation of kinetic study of NiO MOCVD the gas-phase, transformations of (EtCp)2Ni were studied in the temperature range of 380–830 K. Time of reactions corresponding to the residence time of the gas stream in hot zone of the reactor was about 0.1 s under conditions studied. The interaction of (EtCp)2Ni with oxygen started at 450 K and its conversion rate reached the maximum at 700 K. The interaction of (EtCp)2Ni with ozone started at 400 K and its conversion rate reached the maximum at 600 K. Transformations of the gas phase with the temperature in the reaction zone were studied, the model reaction schemes illustrating (EtCp)2Ni transformations in the reaction systems containing oxygen and ozone have developed. In the reaction system (EtCp)2Ni–O2–Ar the main gas-phase products at 380–500 K were CO, CO2, HCO, C2H5OH, CpCOOH, and CpO. Formation of the C2H2O, C3H4O, and C5H8O was found at 630–830 K. The same gas-phase species, (C4H3O)2Ni and dialdehydes was formed in the reaction system (EtCp)2Ni–O3–O2–Ar. |
Databáze: | OpenAIRE |
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