Patterning of ZnO Quantum Dot and PMMA Hybrids with a Solvent-Assisted Technique
Autor: | Richey M. Davis, Kathy Lu, Yifeng Lin |
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Rok vydání: | 2019 |
Předmět: |
Materials science
Economies of agglomeration Nanoparticle Nanotechnology 02 engineering and technology Surfaces and Interfaces 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences 0104 chemical sciences Metal Solvent Quantum dot visual_art Electrochemistry visual_art.visual_art_medium General Materials Science 0210 nano-technology Imprinting (organizational theory) Spectroscopy |
Zdroj: | Langmuir. 35:5855-5863 |
ISSN: | 1520-5827 0743-7463 |
DOI: | 10.1021/acs.langmuir.9b00256 |
Popis: | Imprinting of nanoparticle-polymer hybrids has been a challenging task due to the agglomeration of nanoparticles, especially for metal oxides because of their highly hydrophilic and polar surfaces. We hereby report an effective submicron patterning process of ZnO quantum dot/poly(methyl methacrylate) hybrids with a solvent-assisted lithographic technique. Feature sizes down to 250 nm have been achieved with a ZnO content up to 50 vol %, about 10 times higher than the literature-reported inorganic contents. With higher ZnO contents, particles show a tendency to aggregate, and the samples have less flexibility as demonstrated by larger bending radii before failure. The higher ZnO content samples also produce stronger photoluminescence responses. This family of materials has a great potential to be used in flexible optical devices. |
Databáze: | OpenAIRE |
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