Unveiling a critical thickness in photocatalytic TiO 2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry
| Autor: | Patrick Choquet, W. Ravisy, Agnès Granier, Antoine Goullet, B. Dey, Mireille Richard-Plouet, Simon Bulou |
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| Přispěvatelé: | Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN), Luxembourg Institute of Science and Technology (LIST) |
| Jazyk: | angličtina |
| Rok vydání: | 2021 |
| Předmět: |
010302 applied physics
In situ Materials science Acoustics and Ultrasonics 02 engineering and technology 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials Chemical engineering Plasma-enhanced chemical vapor deposition 0103 physical sciences Photocatalysis [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] Spectroscopic ellipsometry Thin film 0210 nano-technology Critical thickness ComputingMilieux_MISCELLANEOUS |
| Zdroj: | Journal of Physics D: Applied Physics Journal of Physics D: Applied Physics, IOP Publishing, 2021, 54 (44), pp.445303. ⟨10.1088/1361-6463/ac1ec1⟩ |
| ISSN: | 0022-3727 1361-6463 |
| DOI: | 10.1088/1361-6463/ac1ec1⟩ |
| Popis: | International audience |
| Databáze: | OpenAIRE |
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