A survey of some metallographic etching reagents for restoration of obliterated engraved marks on aluminium–silicon alloy surfaces

Autor: Norjaidi Uli, R. Kuppuswamy, Mohd. Firdaus Che Amran
Rok vydání: 2011
Předmět:
Zdroj: Forensic Science International. 208:66-73
ISSN: 0379-0738
DOI: 10.1016/j.forsciint.2010.11.005
Popis: A brief survey to assess the sensitivity and efficacy of some common etching reagents for revealing obliterated engraved marks on Al–Si alloy surfaces is presented. Experimental observations have recommended use of alternate swabbing of 10% NaOH and 10% HNO3 on the obliterated surfaces for obtaining the desired results. The NaOH etchant responsible for bringing back the original marks resulted in the deposition of some dark coating that has masked the recovered marks. The coating had been well removed by dissolving it in HNO3 containing 10–20% acid. However, the above etching procedure was not effective on aluminium (99% purity) and Al–Zn–Mg–Cu alloy surfaces. Also the two reagents (i) immersion in 10% aq. phosphoric acid and (ii) alternate swabbing of 60% HCl and 40% NaOH suggested earlier for high strength Al–Zn–Mg–Cu alloys [23] were quite ineffective on Al–Si alloys. Thus different aluminium alloys needed different etching treatments for successfully restoring the obliterated marks. Al–Si alloys used in casting find wide applications especially in the manufacture of engine blocks of motor vehicles. Hence, the results presented in this paper are of much relevance in serial number restoration problems involving this alloy.
Databáze: OpenAIRE