Patterning enhanced tetragonality in BiFeO3 thin films with effective negative pressure by helium implantation

Autor: Toulouse, Constance, Fischer, J., Farokhipoor, S., Yedra Cardona, Lluís, Carlá, Francesco, Jarnac, A., Elkaim, E., Fertey, P., Audinot, J.-N., Wirtz, Tom, Noheda, B., Garcia, V., Fusil, S., Peral Alonso, I., Guennou, M., Kreisel, J.
Přispěvatelé: Unité mixte de physique CNRS/Thales (UMPhy CNRS/THALES), Centre National de la Recherche Scientifique (CNRS)-THALES, Nanostructures of Functional Oxides, Solid State Materials for Electronics
Jazyk: angličtina
Rok vydání: 2021
Předmět:
Zdroj: Physical Review Materials
Physical Review Materials, American Physical Society, 2021, 5 (2), ⟨10.1103/PHYSREVMATERIALS.5.024404⟩
Physical Review Materials, 5(2):024404. AMER PHYSICAL SOC
Dipòsit Digital de la UB
Universidad de Barcelona
ISSN: 2475-9953
DOI: 10.1103/PHYSREVMATERIALS.5.024404⟩
Popis: Helium implantation in epitaxial thin films is a way to control the out-of-plane deformation independently from the in-plane strain controlled by epitaxy. In particular, implantation by means of a helium microscope allows for local implantation and patterning down to the nanometer resolution, which is of interest for device applications. We present here a study of bismuth ferrite (BiFeO3) films where strain was patterned locally by helium implantation. Our combined Raman, x-ray diffraction, and transmission electron microscopy (TEM) study shows that the implantation causes an elongation of the BiFeO3 unit cell and ultimately a transition towards the so-called supertetragonal polymorph via states with mixed phases. In addition, TEM reveals the onset of amorphization at a threshold dose that does not seem to impede the overall increase in tetragonality. The phase transition from the R-like to T-like BiFeO3 appears as first-order in character, with regions of phase coexistence and abrupt changes in lattice parameters.
Databáze: OpenAIRE