Herbst–multibracket appliance treatment: is there an association between lower incisor position changes and the development of labial gingival recessions?
| Autor: | J. Jost, Niko C. Bock, S. Killat, S. Südwasser, Sabine Ruf |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
Oral health
Cephalometry Parodontalerkrankungen Orthodontics Mandible Malocclusion Angle Class II Mundgesundheit Labial gingival recessions 03 medical and health sciences 0302 clinical medicine Inclination of lower incisors Humans Medicine Gingival Recession 030212 general & internal medicine Extraordinary Treatment Labiale gingivale Rezessionen Incisal Edge business.industry Lateral cephalograms 030206 dentistry Lower incisor Incisor Cementoenamel junction Mandibular plane Orthodontic Appliances Functional Original Article Periodontal disease Oral Surgery Malokklusion Angle-Klasse II Inklination unterer Inzisivi business After treatment Gingival margin |
| Zdroj: | Journal of Orofacial Orthopedics |
| ISSN: | 1615-6714 1434-5293 |
| DOI: | 10.1007/s00056-020-00272-0 |
| Popis: | Purpose To assess a potential association between lower incisor (LI) position changes during Herbst–multibracket appliance (Herbst–MBA) treatment and the development of labial gingival recessions (LGR). Methods All class II patients (Department of Orthodontics, University of Giessen, Giessen, Germany) who had undergone Herbst–MBA treatment until 2015 with study models and lateral cephalograms available from before (T0) and after treatment plus ≥24 months of retention (T3) were included (n = 259). Lateral cephalograms were evaluated regarding LI position changes: iiL/ML (angle between LI long axis and mandibular plane [MP]), ii-MLPg (distance between LI incisal edge and a line perpendicular to MP through pogonion), apex-MLPg (distance between LI apex and a line perpendicular to MP through pogonion), ii-MLii (distance between LI incisal edge and MP on a line perpendicular to MP through incisal edge). Using study models the distance between the cementoenamel junction and the deepest point of the gingival margin was defined as LGR. Results The following cephalometric mean changes were recorded (T0–T3): iiL/ML +5.9 ± 5.76° (p = 0.929), ii-MLPg −0.2 ± 0.25 mm (p = 0.430), apex-MLPg +0.1 ± 0.32 mm (p = 0.363), ii-MLii +0.1 ± 0.36 mm (p = 0.206). The mean increase of LGR magnitude measured on the study models was 0.1 ± 0.35 mm. However, no association with the cephalometric LI position changes was found (|R| ≤ 0.2). Conclusion There is no association between the amount of LI position changes and the development of LGR during Herbst–MBA treatment plus retention. Nevertheless, individual predisposition or excessive treatment changes and extraordinary treatment approaches, respectively, might still lead to development of LGR. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full text from SpringerLink