Challenges in realizing ultraflat materials surfaces
| Autor: | Wataru Nomura, Fabrice Stehlin, Takashi Yatsui, Makoto Naruse, Olivier Soppera, Motoichi Ohtsu |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2013 |
| Předmět: |
Materials science
Photon Phonon Flatness (systems theory) General Physics and Astronomy Polishing Nanotechnology Review Electron lcsh:Chemical technology lcsh:Technology polishing Etching (microfabrication) General Materials Science lcsh:TP1-1185 phonon-assisted process Electrical and Electronic Engineering lcsh:Science lcsh:T lcsh:QC1-999 Nanoscience dressed photon–phonon self-organized process Quasiparticle lcsh:Q Realization (systems) lcsh:Physics |
| Zdroj: | Beilstein Journal of Nanotechnology, Vol 4, Iss 1, Pp 875-885 (2013) Beilstein Journal of Nanotechnology |
| ISSN: | 2190-4286 |
| Popis: | Ultraflat surface substrates are required to achieve an optimal performance of future optical, electronic, or optoelectronic devices for various applications, because such surfaces reduce the scattering loss of photons, electrons, or both at the surfaces and interfaces. In this paper, we review recent progress toward the realization of ultraflat materials surfaces. First, we review the development of surface-flattening techniques. Second, we briefly review the dressed photon–phonon (DPP), a nanometric quasiparticle that describes the coupled state of a photon, an electron, and a multimode-coherent phonon. Then, we review several recent developments based on DPP-photochemical etching and desorption processes, which have resulted in angstrom-scale flat surfaces. To confirm that the superior flatness of these surfaces that originated from the DPP process, we also review a simplified mathematical model that describes the scale-dependent effects of optical near-fields. Finally, we present the future outlook for these technologies. |
| Databáze: | OpenAIRE |
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