Microsieves made with laser interference lithography for micro-filtration applications
| Autor: | Miko Elwenspoek, Henk van Wolferen, Wietze Nijdam, Stein Kuiper, Gert J. Veldhuis, Cees J.M. van Rijn |
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| Rok vydání: | 1999 |
| Předmět: |
Materials science
Silicon business.industry Mechanical Engineering Microfiltration chemistry.chemical_element Nanotechnology IR-14592 Electronic Optical and Magnetic Materials law.invention Interference lithography Sieve chemistry.chemical_compound Membrane Silicon nitride chemistry EWI-13214 Mechanics of Materials law METIS-111688 Optoelectronics Electrical and Electronic Engineering business Lithography Filtration |
| Zdroj: | Journal of micromechanics and microengineering, 9(2), 170-172. IOP Publishing Ltd. |
| ISSN: | 0960-1317 |
| Popis: | A microsieve with a very uniform pore size of 260 nm and a pore to pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micro-machining technology. The sieve consists of a 0.1 µm thick silicon nitride membrane perforated with sub-micron diameter pores and a macro perforated silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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