| Autor: |
Yuan Dong, Wan Khai Loke, Qian Zhou, Dian Lei, Wei Wang, Gengchiau Liang, Soon Fatt Yoon, Eng Soon Tok, Xiao Gong, Shuh Ying Lee, Yee-Chia Yeo |
| Rok vydání: |
2015 |
| Předmět: |
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| Zdroj: |
Optics express. 23(14) |
| ISSN: |
1094-4087 |
| Popis: |
We demonstrate that a complementary metal-oxide-semiconductor (CMOS) compatible silicon (Si) surface passivation technique effectively suppress the dark current originating from the mesa sidewall of the Ge(0.95)Sn(0.05) on Si (Ge(0.95)Sn(0.05)/Si) p-i-n photodiode. Current-voltage (I-V) characteristics show that the sidewall surface passivation technique could reduce the surface leakage current density (Jsurf) of the photodiode by ~100 times. A low dark current density (Jdark) of 0.073 A/cm(2) at a bias voltage of -1 V is achieved, which is among the lowest reported values for Ge(1-x)Sn(x)/Si p-i-n photodiodes. Temperature-dependent I-V measurement is performed for the Si-passivated and non-passivated photodiodes, from which the activation energies of dark current are extracted to be 0.304 eV and 0.142 eV, respectively. In addition, the optical responsivity of the Ge(0.95)Sn(0.05)/Si p-i-n photodiodes to light signals with wavelengths ranging from 1510 nm to 1877 nm is reported. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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