SiO2-P2O5-HfO2-Al2O3-Na2O glasses activated by Er3+ ions: From bulk sample to planar waveguide fabricated by rf-sputtering

Autor: Alessandro Vaccari, Erica Iacob, L. Zur, M. Cotti, Anna Lukowiak, G. C. Righini, Dominik Dorosz, Alessandro Chiasera, Mariano Ferrari, Stefano Varas, Sreeramulu Valligatla, Giorgio Speranza, Iustyna Vasilchenko
Jazyk: angličtina
Rok vydání: 2017
Předmět:
Zdroj: Optical materials (Amst., Print) 63 (2017): 153–157. doi:10.1016/j.optmat.2016.06.025
info:cnr-pdr/source/autori:A. Chiasera, I. Vasilchenko, b, D. Dorosz, M. Cotti, S. Varas, E. Iacob, G. Speranza, A. Vaccari, S. Valligatla, L. Zur, A. Lukowiak, G.C. Righini, M. Ferrari/titolo:SiO2-P2O5-HfO2-Al2O3-Na2O glasses activated by Er3+ ions: From bulk sample to planar waveguide fabricated by rf-sputtering/doi:10.1016%2Fj.optmat.2016.06.025/rivista:Optical materials (Amst., Print)/anno:2017/pagina_da:153/pagina_a:157/intervallo_pagine:153–157/volume:63
DOI: 10.1016/j.optmat.2016.06.025
Popis: 0.4 Er3+-doped 90.7 SiO2 – 4.4 P2O5 – 2.3 HfO2 – 1.7 Al2O3 – 0.7 Na2O planar waveguide was fabricated by multi-target rf-sputtering technique starting by massive Er3+-activated P2O5-SiO2-Al2O3-Na2O glass. The optical parameters were measured by m-line apparatus operating at 632.8, 1319 and 1542 nm. The waveguide compositions were investigated by Energy Dispersive X-ray Spectroscopy and its morphology analyzed by Atomic Force Microscopy. The waveguide exhibits a single propagation mode at 1319 and 1542 nm with an attenuation coefficient of 0.2 dB/cm in the infrared. The emission of 4I13/2 → 4I15/2 transition of Er3+ ion, with a 28.5 nm bandwidth was observed upon TE0 mode excitation at 514.5 nm. The optical and spectroscopic features of the Er3+-activated parent P2O5-SiO2-Al2O3-Na2O glass were also investigated.
Databáze: OpenAIRE