Tribological characterization of carbon-nitrogen coatings deposited by using vacuum arc discharge
Autor: | J. Levoska, Jari Koskinen, Juha-Pekka Hirvonen, P. Torri |
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Rok vydání: | 1996 |
Předmět: |
Materials science
Silicon Mechanical Engineering Analytical chemistry chemistry.chemical_element General Chemistry Vacuum arc Microstructure Nitrogen Electronic Optical and Magnetic Materials chemistry.chemical_compound symbols.namesake Carbon film chemistry Vacuum deposition Materials Chemistry symbols Electrical and Electronic Engineering Raman spectroscopy Carbon nitride |
Zdroj: | Koskinen, J, Hirvonen, J-P, Levoska, J & Torri, P 1996, ' Tribological characterization of carbon nitrogen coatings deposited by using vacuum arc discharge ', Diamond and Related Materials, vol. 5, no. 6-8, pp. 669-673 . https://doi.org/10.1016/0925-9635(95)00382-7 |
ISSN: | 0925-9635 |
Popis: | Carbon nitride (CN) films have been deposited by using the pulsed vacuum arc method on silicon and metallic substrates. Films were deposited in a nitrogen gas ambient varying between 0.01 and 0.56 Pa. The nitrogen content of the films as analysed by using ion-beam methods (NRA) varied from 0 to 34 at.%. The microstructure was characterized by using Raman spectroscopy.The wear and friction properties of the CN films as a function of nitrogen content were measured by using a pin-on-disk apparatus. The CN films had consistently higher coefficient of friction as the nitrogen content was increased, especially at lower values of relative humidity. Against the steel pin, wear rates of the CN films varied from 0.1 to 0.5 × 10−16 m3 N−1 m−1 as the nitrogen content grew from 0 to 34 at.%, respectively. The compressive stress of the films with high nitrogen concentration was significantly lower than for pure DLC, which allows the growth of film material with an excellent wear resistance and a higher film thickness. |
Databáze: | OpenAIRE |
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