Observation of an fcc–Co nanolayer grown between CoO and amorphous Si
| Autor: | R. Morari, Anatolie Sidorenko, Aladin Ullrich, Reinhard Tidecks, Siegfried Horn, D. Lenk, V. I. Zdravkov |
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| Rok vydání: | 2017 |
| Předmět: |
Materials science
Spinel Nanotechnology Heterojunction 02 engineering and technology General Chemistry engineering.material 021001 nanoscience & nanotechnology 01 natural sciences Amorphous solid Crystallography Si substrate Transmission electron microscopy Lattice (order) 0103 physical sciences engineering General Materials Science Nanometre Thin film 010306 general physics 0210 nano-technology |
| Zdroj: | Applied Physics A |
| ISSN: | 1432-0630 0947-8396 |
| DOI: | 10.1007/s00339-017-1375-6 |
| Popis: | The thermodynamically crystallographic phase of Co at ambient conditions is hexagonal-close-packed. However, it has been found that given a crystallographic support from a suitable substrate, the high-temperature face-centered-cubic phase can be stabilized in thin films. We performed cross-sectional high-resolution transmission electron microscopy on a Si substrate/Si buffer/Co/CoO/Cu$$_{41}$$ Ni$$_{59}$$ /Nb/Cu$$_{41}$$ Ni$$_{59}$$ /Si-cap heterostructure (all layer thicknesses in the nanometer range). We analyzed lattice spacings and angles of the Co layer and neighbouring layers. While in the present study, there is no obvious support for an fcc structure by the amorphous Si buffer and the CoO (spinel structure), only an fcc phase of the Co layer (of about 5 nm thickness) is in agreement with the obtained results. However, the detailed mechanism of phase stabilization remains unresolved. |
| Databáze: | OpenAIRE |
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