Measurements of Deflection and Residual Stress in Thin Films Utilizing Coherent Light Reflection/Projection Moiré Interferometry
| Autor: | C. A. Sciammarella, Antonio Boccaccio, Carmine Pappalettere, M. A. Signore, Luciano Lamberti, D. Valerini, Antonella Rizzo |
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| Jazyk: | angličtina |
| Rok vydání: | 2013 |
| Předmět: |
Microelectromechanical systems
Materials science Residual stresses Thin films Reflection moire Projection moire business.industry Mechanical Engineering Aerospace Engineering engineering.material Interferometry Optics Coating Mechanics of Materials Deflection (engineering) Residual stress Solid mechanics engineering Thin film business Computer technology |
| Popis: | Thin film technology is an area of great importance in current applications of opto-electronics, electronics, MEMS and computer technology. A critical issue in thin film technology is residual stresses that arise when the coating is deposited onto a substrate. Residual stresses can be very large in magnitude and have detrimental effects on the role that the thin film must play. To save development time on coating deposition processes it is important to perform accurate residual stresses measurements in situ in real time where the deposition is made. A novel optical set up is developed in this study to measure deflections and residual stresses generated in coated specimens that can be applied directly in the reactor utilized in the deposition process. Experimental results are in good agreement with other measurements carried out independently and other data reported in literature for thin films like those tested in the experiments. |
| Databáze: | OpenAIRE |
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