Time Invariant Surface Roughness Evolution during Atmospheric Pressure Thin Film Depositions
| Autor: | Toh-Ming Lu, Robert F. Spivey, Thomas Merkh |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Multidisciplinary Materials science Atmospheric pressure Mean free path Flux 02 engineering and technology Surface finish Mechanics 021001 nanoscience & nanotechnology Critical value 01 natural sciences Article 0103 physical sciences Surface roughness Thin film Invariant (mathematics) 0210 nano-technology |
| Zdroj: | Scientific Reports |
| ISSN: | 2045-2322 |
| Popis: | The evolution of thin film morphology during atmospheric pressure deposition has been studied utilizing Monte Carlo methods. Time invariant root-mean-squared roughness and local roughness morphology were both observed when employing a novel simulation parameter, modeling the effect of the experimental high pressure condition. This growth regime, where the surface roughness remains invariant after reaching a critical value, has not been classified by any existing universality class. An anti-shadowing growth mechanism responsible for this regime occurs when particles undergo binary collisions beneath the surface apexes. Hence, this mechanism is applicable when the mean free path of the depositing species is comparable to the amplitude of the surface features. Computationally this has been modeled by allowing particles to change direction at a specified height above the local film surface. This modification of the incoming flux trajectory consequently has a dramatic smoothening effect and the resulting surfaces appear in agreement with recent experimental observations. |
| Databáze: | OpenAIRE |
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