Modeling and simulation of the influence of SOI structure on damage evolution and ultra-shallow junction formed by Ge preamorphization implants and solid phase epitaxial regrowth

Autor:	Caroline Mok, J. E. Rubio, Francis Benistant, M.P. Srinivasan, J. J. Hamilton, Ignacio Martin-Bragado, Pedro Castrillo, R. Pinacho, B. Colombeau, Martín Jaraíz
Předmět:	Recrystallization (geology) Materials science Dopant Silicon business.industry Silicon on insulator chemistry.chemical_element Dopant Activation Epitaxy Microbiology chemistry Optoelectronics Wafer Kinetic Monte Carlo business
Zdroj:	Scopus-Elsevier ResearcherID
Popis:	Preamorphization implant (PAI) prior to dopant implantation, followed by solid phase epitaxial regrowth (SPER) is of great interest due to its ability to form highly-activated ultra-shallow junctions. Coupled with growing interest in the use of silicon-on-insulator (SOI) wafers, modeling and simulating the influence of SOI structure on damage evolution and ultra-shallow junction formation is required. In this work, we use a kinetic Monte Carlo (kMC) simulator to model the different mechanisms involved in the process of ultra-shallow junction formation, including amorphization, recrystallization, defect interaction and evolution, as well as dopant-defect interaction in both bulk silicon and SOI. Simulation results of dopant concentration profiles and dopant activation are in good agreement with experimental data and can provide important insight for optimizing the process in bulk silicon and SOI.
Databáze:	OpenAIRE
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