Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications
Autor: | Nenad Bundaleski, Miroslav Abrashev, Uroš Cvelbar, Elena Tatarova, Evgenia Valcheva, D. Tsyganov, Janez Zavašnik, J. Kissovski, N. Bundaleska, E. Felizardo, A. Dias, A.M. Botelho do Rego, Ana Maria Ferraria, Julio Henriques, Amélia Almeida, Thomas Strunskus, Orlando M. N. D. Teodoro |
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Přispěvatelé: | DF – Departamento de Física, CeFITec – Centro de Física e Investigação Tecnológica |
Jazyk: | angličtina |
Rok vydání: | 2020 |
Předmět: |
Materials science
chemistry.chemical_element lcsh:Medicine 02 engineering and technology 01 natural sciences Article Secondary electrons law.invention chemistry.chemical_compound law 0103 physical sciences lcsh:Science Plasmon 010302 applied physics Multidisciplinary Methylamine Graphene Physics Doping lcsh:R technology industry and agriculture 021001 nanoscience & nanotechnology Ion source chemistry Chemical engineering Secondary emission lcsh:Q 0210 nano-technology Carbon |
Zdroj: | Scientific Reports, Vol 10, Iss 1, Pp 1-13 (2020) Scientific Reports Repositório Científico de Acesso Aberto de Portugal Repositório Científico de Acesso Aberto de Portugal (RCAAP) instacron:RCAAP |
ISSN: | 2045-2322 |
Popis: | PTDC/NAN-MAT/30565/2017 D01-284/2019 (INFRAMAT) IBB BASE 2020-2023 UID/FIS/00068/2019. The ability to change the secondary electron emission properties of nitrogen-doped graphene (N-graphene) has been demonstrated. To this end, a novel microwave plasma-enabled scalable route for continuous and controllable fabrication of free-standing N-graphene sheets was developed. High-quality N-graphene with prescribed structural qualities was produced at a rate of 0.5 mg/min by tailoring the high energy density plasma environment. Up to 8% of nitrogen doping levels were achieved while keeping the oxygen content at residual amounts ( 1%). The synthesis is accomplished via a single step, at atmospheric conditions, using ethanol/methane and ammonia/methylamine as carbon and nitrogen precursors. The type and level of doping is affected by the position where the N-precursor is injected in the plasma environment and by the type of precursors used. Importantly, N atoms incorporated predominantly in pyridinic/pyrrolic functional groups alter the performance of the collective electronic oscillations, i.e. plasmons, of graphene. For the first time it has been demonstrated that the synergistic effect between the electronic structure changes and the reduction of graphene $-plasmons caused by N doping, along with the peculiar “crumpled” morphology, leads to sub-unitary (textless 1) secondary electron yields. N-graphene can be considered as a prospective low secondary electron emission and plasmonic material. publishersversion published |
Databáze: | OpenAIRE |
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