Autor:	John Colligon
Rok vydání:	2003
Předmět:	Materials science Sputtering General Mathematics Scientific method General Engineering General Physics and Astronomy Nanotechnology Thin film Sputter deposition Ion
Zdroj:	Philosophical Transactions of the Royal Society of London. Series A: Mathematical, Physical and Engineering Sciences. 362:103-116
ISSN:	1471-2962 1364-503X
DOI:	10.1098/rsta.2003.1303
Popis:	A review of the development of the ion-assisted sputter-deposition process is given. The special features of thin films produced by this technique are outlined and some main applications and future developments are discussed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::79c32e732d5e5ea9cb8c6417a6e30f58 https://doi.org/10.1098/rsta.2003.1303 Zobrazit plný text záznamu