Investigation of the structure of thin HfO2films by soft x-ray reflectometry techniques

Autor:	Franz Schaefers, Igor V. Kozhevnikov, Elena O. Filatova, Walter Braun, E. Yu. Taracheva, O S Grunsky, Andrey Sokolov
Rok vydání:	2009
Předmět:	Diffraction Soft x ray Materials science business.industry Crystal structure Condensed Matter Physics Microstructure Amorphous phase Crystallography Optoelectronics General Materials Science Metalorganic vapour phase epitaxy Thin film Reflectometry business
Zdroj:	Journal of Physics: Condensed Matter. 21:185012
ISSN:	1361-648X 0953-8984
DOI:	10.1088/0953-8984/21/18/185012
Popis:	HfO(2) thin films of different thicknesses and deposited by two methods (ALD and MOCVD) were studied. The microstructure of films was characterized by reflection spectroscopy, x-ray diffraction (XRD), and soft x-ray reflectometry. It was established that the HfO(2) film microstructure is closely dependent on film thickness. The 5 nm thick film synthesized by ALD shows an amorphous phase while the film prepared by MOCVD was inhomogeneous in depth and showed signs of crystalline structure. First results on the reconstruction of the depth distribution of chemical elements based on the analysis of reflectivity curves are discussed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7993a03b06b06a11835d575f2a8560aa https://doi.org/10.1088/0953-8984/21/18/185012 Zobrazit plný text záznamu