Development of in-situ particle monitor with beam homogenizing module for enhancement of nanoparticle countering efficiency
| Autor: | Jongho Kim, Sang-Woo Kang, Jihun Mun, Sung Kyu Lim, Sang-Hyun Park, Jong Yeon Lim, Chang-Sug Lee, Kyuhang Lee |
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| Rok vydání: | 2019 |
| Předmět: |
010302 applied physics
Total internal reflection Materials science business.industry Nanoparticle Laser 01 natural sciences 010305 fluids & plasmas law.invention law Scanning mobility particle sizer 0103 physical sciences Optoelectronics Measurement uncertainty Particle business Instrumentation Beam (structure) Gaussian beam |
| Zdroj: | The Review of scientific instruments. 90(9) |
| ISSN: | 1089-7623 |
| Popis: | An in situ particle monitor (ISPM) was developed to measure the concentration of several hundred nanosized contaminant particles generated from the semiconductor process. It is difficult to measure particles below 300 nm owing to low sensitivity and reliability. To improve the sensitivity and reduce the uncertainty caused by the Gaussian distribution of laser, a beam homogenizing module was applied to transform the Gaussian beam into a flat-top beam by total internal reflection. The performance of the beam-homogenizing ISPM was evaluated by measuring standard polystyrene latex particles in vacuum. We analyzed the measurement efficiency by a comparative evaluation with a scanning mobility particle sizer. Following this, the count of particles generated from the exhaust line of a plasma-enhanced chemical vapor deposition process was measured for real-time process diagnosis. |
| Databáze: | OpenAIRE |
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