Nanopatterns with a Square Symmetry from an Orthogonal Lamellar Assembly of Block Copolymers
| Autor: | Jaeup U. Kim, Daeseong Yong, Kyu Hyo Han, Seung Keun Cha, Jang Hwan Kim, Seong-Jun Jeong, Hyeong Min Jin, Geon Gug Yang, Sang Ouk Kim |
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| Rok vydání: | 2019 |
| Předmět: |
Materials science
business.industry 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Square (algebra) Symmetry (physics) 0104 chemical sciences Trench Perpendicular Optoelectronics General Materials Science Lamellar structure Grain boundary Nanodot 0210 nano-technology business Lithography |
| Zdroj: | ACS Applied Materials & Interfaces. 11:20265-20271 |
| ISSN: | 1944-8252 1944-8244 |
| DOI: | 10.1021/acsami.9b03632 |
| Popis: | A nanosquare array is an indispensable element for the integrated circuit design of electronic devices. Block copolymer (BCP) lithography, a promising bottom-up approach for sub-10 nm patterning, has revealed a generic difficulty in the production of square symmetry because of the thermodynamically favored hexagonal packing of self-assembled sphere or cylinder arrays in thin-film geometry. Here, we demonstrate a simple route to square arrays via the orthogonal self-assembly of two lamellar layers on topographically patterned substrates. While bottom lamellar layers within a topographic trench are aligned parallel to the sidewalls, top layers above the trench are perpendicularly oriented to relieve the interfacial energy between grain boundaries. The size and period of the square symmetry are readily controllable with the molecular weight of BCPs. Moreover, such an orthogonal self-assembly can be applied to the formation of complex nanopatterns for advanced applications, including metal nanodot square arrays. |
| Databáze: | OpenAIRE |
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